The global and independent platform for the SAP community.

Author: Christian Strebe, Gisa

Horizontal Versus Vertical AI

June 6, 2025
Horizontal AI integrates AI solutions across different applications and business areas. Vertical AI, on the other hand, focuses on specific tasks or industries. What are the advantages of these two approaches?
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Working on the SAP basis is crucial for successful S/4 conversion. 

This gives the Competence Center strategic importance for existing SAP customers. Regardless of the S/4 Hana operating model, topics such as Automation, Monitoring, Security, Application Lifecycle Management and Data Management the basis for S/4 operations.

For the second time, E3 magazine is organizing a summit for the SAP community in Salzburg to provide comprehensive information on all aspects of S/4 Hana groundwork.

Venue

FourSide Hotel Salzburg,
Trademark Collection by Wyndham
Am Messezentrum 2, 5020 Salzburg, Austria
+43-66-24355460

Event date

Wednesday, June 10, and
Thursday, June 11, 2026

Early Bird Ticket

Regular ticket

EUR 390 excl. VAT
available until 1.10.2025
EUR 590 excl. VAT

Venue

Hotel Hilton Heidelberg
Kurfürstenanlage 1
D-69115 Heidelberg

Event date

Wednesday, April 22 and
Thursday, April 23, 2026

Tickets

Regular ticket
EUR 590 excl. VAT
Subscribers to the E3 magazine
reduced with promocode STAbo26
EUR 390 excl. VAT
Students*
reduced with promocode STStud26.
Please send proof of studies by e-mail to office@b4bmedia.net.
EUR 290 excl. VAT
*The first 10 tickets are free of charge for students. Try your luck! 🍀
The event is organized by the E3 magazine of the publishing house B4Bmedia.net AG. The presentations will be accompanied by an exhibition of selected SAP partners. The ticket price includes attendance at all presentations of the Steampunk and BTP Summit 2026, a visit to the exhibition area, participation in the evening event and catering during the official program. The lecture program and the list of exhibitors and sponsors (SAP partners) will be published on this website in due course.